Pal Rohit, Sung Kyung Eun, Burns Mark A
Department of Chemical Engineering, University of Michigan, Ann Arbor, Michigan 48109, USA.
Langmuir. 2006 Jun 6;22(12):5392-7. doi: 10.1021/la052811s.
A microfabrication technique that uses a photolithographically patterned film as a microstencil has been developed. This microstencil has a bilayer structure comprised of parylene and SU-8 films with thicknesses from 4 to 100 microm. The parylene layer enables the microstencil to be mechanically peeled from hydrophilic substrates. Since no chemicals are required to release the microstencil, this technique can be used to pattern chemically and biologically sensitive materials. The amount of material deposited can be automatically controlled by the height of the SU-8 structures or externally controlled by spin coating or other thin film deposition techniques. This patterning method is very versatile and has been used to pattern features as small as 25 by 25 microm on silicon, glass, and polymer substrates. As an initial demonstration, we have patterned wax, cells, proteins, sol, and CYTOP.
一种利用光刻图案化薄膜作为微模板的微加工技术已被开发出来。这种微模板具有由聚对二甲苯和SU-8薄膜组成的双层结构，厚度从4到100微米不等。聚对二甲苯层使微模板能够从亲水性基板上机械剥离。由于无需化学物质来释放微模板，该技术可用于对化学和生物敏感材料进行图案化。沉积材料的量可以通过SU-8结构的高度自动控制，也可以通过旋涂或其他薄膜沉积技术进行外部控制。这种图案化方法非常通用，已被用于在硅、玻璃和聚合物基板上对小至25×25微米的特征进行图案化。作为初步演示，我们已对蜡、细胞、蛋白质、溶胶和CYTOP进行了图案化。
