Chandra R, Chawla A K, Ayyub P
Institute Instrumentation Centre, Indian Institute of Technology, Roorkee.
J Nanosci Nanotechnol. 2006 Apr;6(4):1119-23. doi: 10.1166/jnn.2006.176.
We report the effect of the atomic mass of the sputtering gas (He, Ne, Ar, Kr, and Xe) on the structure and optical properties of nanocrystalline cuprous oxide (Cu2O) thin films deposited by dc magnetron sputtering. The crystal structure and surface morphology were studied by X-ray diffraction (XRD) and atomic force microscopy (AFM) respectively. We find that the atomic mass of the sputtering gas significantly affects the primary crystallite size as well as the surface morphology and texture. Optical reflectance and transmission measurements show that the nanocrystalline thin films are transparent over most of the visible region. The HOMO-LUMO gap obtained from optical absorption spectra show a size-dependent quantum shift with respect to the bulk band gap reported for Cu2O (2.1 eV).
我们报道了溅射气体（氦、氖、氩、氪和氙）的原子质量对通过直流磁控溅射沉积的纳米晶氧化亚铜（Cu2O）薄膜的结构和光学性质的影响。分别通过X射线衍射（XRD）和原子力显微镜（AFM）研究了晶体结构和表面形貌。我们发现溅射气体的原子质量显著影响初级微晶尺寸以及表面形貌和织构。光学反射率和透射率测量表明，纳米晶薄膜在大部分可见光区域是透明的。从光吸收光谱获得的HOMO-LUMO能隙相对于报道的Cu2O体带隙（2.1 eV）显示出尺寸依赖的量子位移。
