Boyd David A, Greengard Leslie, Brongersma Mark, El-Naggar Mohamed Y, Goodwin David G
Division of Engineering and Applied Science, California Institute of Technology, Pasadena, California 91125, USA.
Nano Lett. 2006 Nov;6(11):2592-7. doi: 10.1021/nl062061m.
We introduce a new chemical vapor deposition (CVD) process that can be used to selectively deposit materials of many different types. The technique makes use of the plasmon resonance in nanoscale metal structures to produce the local heating necessary to initiate deposition when illuminated by a focused low-power laser. We demonstrate the technique, which we refer to as plasmon-assisted CVD (PACVD), by patterning the spatial deposition of PbO and TiO(2) on glass substrates coated with a dispersion of 23 nm gold particles. The morphology of both oxide deposits is consistent with local laser-induced heating of the gold particles by more than 150 degrees C. We show that temperature changes of this magnitude are consistent with our analysis of the heat-loss mechanisms. The technique is general and can be used to spatially control the deposition of virtually any material for which a CVD process exists.
我们介绍了一种新的化学气相沉积（CVD）工艺，该工艺可用于选择性地沉积许多不同类型的材料。该技术利用纳米级金属结构中的等离子体共振，在聚焦低功率激光照射时产生启动沉积所需的局部加热。我们通过在涂覆有23nm金颗粒分散体的玻璃基板上对PbO和TiO₂的空间沉积进行图案化，展示了我们称为等离子体辅助CVD（PACVD）的技术。两种氧化物沉积物的形态与金颗粒局部激光诱导加热超过150℃一致。我们表明，这种程度的温度变化与我们对热损失机制的分析一致。该技术具有通用性，可用于在空间上控制几乎任何存在CVD工艺的材料的沉积。
