Li Chunya
College of Chemistry and Materials Science, South-Central University for Nationalities, Wuhan 430074, China.
Colloids Surf B Biointerfaces. 2007 Mar 15;55(1):77-83. doi: 10.1016/j.colsurfb.2006.11.009. Epub 2006 Nov 16.
Electrochemical behaviors of dipyridamole (DIP) at a carbon paste electrode in the presence of cetyltrimethyl ammonium bromide (CTAB) were investigated by voltammetry, chronocoulometry and electrochemical impedance spectroscopy (EIS). The results indicated that the electrochemical responses of DIP are apparently improved by CTAB, due to the enhanced accumulation of dipyridamole at the carbon paste electrode surface. Electrochemical parameters for the oxidation of DIP were explored by chronocoulometry. Under optimal conditions, the oxidation peak current at 0.53 V was proportional to DIP concentration in the range of 0.03-12 microg mL-1, with a detection limit of 0.01 microg mL-1 for 120 s accumulation by different pulse voltammetry (DPV). This method was applied to the determination of DIP in the tablet samples. The results were satisfying compared with that obtained by standardized method of high performance liquid chromatography (HPLC).
采用伏安法、计时库仑法和电化学阻抗谱（EIS）研究了双嘧达莫（DIP）在十六烷基三甲基溴化铵（CTAB）存在下于碳糊电极上的电化学行为。结果表明，由于双嘧达莫在碳糊电极表面的积累增强，CTAB显著改善了DIP的电化学响应。通过计时库仑法探究了DIP氧化的电化学参数。在最佳条件下，0.53 V处的氧化峰电流与DIP浓度在0.03 - 12 μg mL-1范围内成正比，采用差分脉冲伏安法（DPV）在120 s积累时的检测限为0.01 μg mL-1。该方法应用于片剂样品中DIP的测定。与高效液相色谱（HPLC）标准方法所得结果相比，结果令人满意。
