Own C S, Sinkler W, Marks L D
Department of Materials Science and Engineering, Northwestern University, Evanston, IL 60201, USA.
Ultramicroscopy. 2007 Jun-Jul;107(6-7):534-42. doi: 10.1016/j.ultramic.2006.03.011. Epub 2006 Dec 12.
Recent developments in aberration control in the TEM have yielded a tremendous enhancement of direct imaging capabilities for studying atomic structures. However, aberration correction also has substantial benefits for achieving ultra-resolution in the TEM through reciprocal space techniques. Several tools are available that allow very accurate detection of the electron distribution in surfaces allowing precise atomic-scale characterization through statistical inversion techniques from diffraction data. The precession technique now appears to extend this capability to the bulk. This article covers some of the progress in this area and details requirements for a next-generation analytical diffraction instrument. An analysis of the contributions offered by aberration correction for precision electron precession is included.
透射电子显微镜(TEM)中像差控制的最新进展极大地增强了用于研究原子结构的直接成像能力。然而,像差校正对于通过倒易空间技术在TEM中实现超分辨率也具有重大益处。有几种工具可用于非常精确地检测表面的电子分布,从而通过基于衍射数据的统计反演技术实现精确的原子尺度表征。现在,进动技术似乎将这种能力扩展到了体材料。本文涵盖了该领域的一些进展,并详细介绍了下一代分析衍射仪器的要求。其中还包括对像差校正对精确电子进动的贡献的分析。