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高分辨率透射电子显微镜以及直接和间接像差校正的应用。

High-resolution TEM and the application of direct and indirect aberration correction.

作者信息

Hetherington Crispin J D, Chang Lan-Yun Shery, Haigh Sarah, Nellist Peter D, Gontard Lionel Cervera, Dunin-Borkowski Rafal E, Kirkland Angus I

机构信息

Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, UK.

出版信息

Microsc Microanal. 2008 Feb;14(1):60-7. doi: 10.1017/S1431927608080148. Epub 2008 Jan 3.

DOI:10.1017/S1431927608080148
PMID:18171500
Abstract

Aberration correction leads to a substantial improvement in the directly interpretable resolution of transmission electron microscopes. Correction of the aberrations has been achieved electron-optically through a hexapole-based corrector and also indirectly by computational analysis of a focal or tilt series of images. These direct and indirect methods are complementary, and a combination of the two offers further advantages. Materials characterization has benefitted from the reduced delocalization and higher resolution in the corrected images. It is now possible, for example, to locate atomic columns at surfaces to higher accuracy and reliability. This article describes the JEM-2200FS in Oxford, which is equipped with correctors for both the image-forming and probe-forming lenses. Examples of the use of this instrument in the characterization of nanocrystalline catalysts are given together with initial results combining direct and indirect methods. The double corrector configuration enables direct imaging of the corrected probe, and a potential confocal imaging mode is described. Finally, modifications to a second generation instrument are outlined.

摘要

像差校正显著提高了透射电子显微镜的直接可解释分辨率。已经通过基于六极的校正器以电子光学方式实现了像差校正,并且也通过对聚焦或倾斜系列图像的计算分析间接实现了像差校正。这些直接和间接方法是互补的,两者结合具有更多优势。材料表征受益于校正图像中减少的离域化和更高的分辨率。例如,现在可以更准确、更可靠地定位表面的原子列。本文介绍了牛津的JEM - 2200FS,它配备了成像透镜和探针形成透镜的校正器。给出了该仪器在纳米晶催化剂表征中的使用示例以及结合直接和间接方法的初步结果。双校正器配置能够对校正后的探针进行直接成像,并描述了一种潜在的共聚焦成像模式。最后,概述了对第二代仪器的改进。

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