Klie Robert F, Johnson Craig, Zhu Yimei
Institute for Advanced Electron Microscopy, Brookhaven National Laboratory, Upton, NY 11973, USA.
Microsc Microanal. 2008 Feb;14(1):104-12. doi: 10.1017/S1431927608080136. Epub 2008 Jan 3.
We report on the performance of our aberration-corrected JEOL-JEM2200FS electron microscope. This high-resolution field-mission TEM/STEM is equipped with a Schottky field-emission gun operated at 200 kV, a CEOS probe corrector, and an in-column energy filter. We focus on the performance of the probe corrector and show that the Si [110] dumbbell structure can be routinely resolved in STEM mode with the power spectrum indicating a probe size of approximately 1 A. Ronchigram analysis suggests that the constant phase area is extended from 15 mrad to 35 mrad after corrector tuning. We also report the performance of our newly installed JEOL-JEM2200MCO, an upgraded version of the JEM2200FS, equipped with two CEOS aberration correctors (and a monochromator), one for the probe-forming lens and the other for the postspecimen objective lens. Based on Young's fringe analysis of Au particles on amorphous Ge, initial results show that the information limit in TEM mode with the aberration correction (Cs = -3.8 microm) is approximately 0.12 nm. Materials research applications using these two instruments are described including atomic-column-resolved Z-contrast imaging and electron energy-loss spectroscopy of oxide hetero-interfaces and strain mapping of a SrTiO3 tilt-grain boundary. The requirements for a high-precision TEM laboratory to house an aberration-corrected microscope are also discussed.
我们报告了我们的像差校正JEOL-JEM2200FS电子显微镜的性能。这台高分辨率场发射透射电子显微镜/扫描透射电子显微镜配备了在200 kV下运行的肖特基场发射枪、CEOS探针校正器和柱内能量过滤器。我们重点关注探针校正器的性能，并表明在扫描透射电子显微镜模式下可以常规分辨出Si [110]哑铃结构，功率谱显示探针尺寸约为1埃。罗恩奇图分析表明，在校正器调谐后，恒定相位区域从15毫弧度扩展到35毫弧度。我们还报告了我们新安装的JEOL-JEM2200MCO的性能，它是JEM2200FS的升级版，配备了两个CEOS像差校正器（和一个单色仪），一个用于探针形成透镜，另一个用于样品后物镜。基于对非晶态Ge上Au颗粒的杨氏条纹分析，初步结果表明，像差校正（Cs = -3.8微米）的透射电子显微镜模式下的信息极限约为0.12纳米。描述了使用这两台仪器的材料研究应用，包括原子柱分辨的Z衬度成像、氧化物异质界面的电子能量损失谱以及SrTiO3倾斜晶界的应变映射。还讨论了容纳像差校正显微镜的高精度透射电子显微镜实验室的要求。
