Laser-interference lithography tailored for highly symmetrically arranged ZnO nanowire arrays.
作者信息
Kim Dong Sik, Ji Ran, Fan Hong Jin, Bertram Frank, Scholz Roland, Dadgar Armin, Nielsch Kornelius, Krost Alois, Christen Jürgen, Gösele Ulrich, Zacharias Margit
机构信息
Max Planck Institute of Microstructure Physics, Weinberg 2, 06120 Halle, Germany.
出版信息
Small. 2007 Jan;3(1):76-80. doi: 10.1002/smll.200600307.
PMID:17294473
Abstract
摘要
Zotero 插件