Cho Yasuo
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan.
J Nanosci Nanotechnol. 2007 Jan;7(1):105-16.
An investigation of ultrahigh-density ferroelectric data storage based on scanning nonlinear dielectric microscopy (SNDM) is described. For the purpose of obtaining fundamental knowledge on high-density ferroelectric data storage, several experiments on nanodomain formation in a lithium tantalate (LiTaO3) single crystal were conducted. Through domain engineering, a domain dot array with an areal density of 1.5 Tbit/inch2 was formed on congruent LiTaO3 (CLT). Sub-nanosecond (500 psec) domain switching speed also has been achieved. Next, actual information storage is demonstrated at a density of 1 Tbit/inch2. Finally, it is described that application of a very small dc offset voltage is very effective in accelerating the domain switching speed and in stabilizing the reversed nano-domain dots. Applying this offset application technique, we formed a smallest artificial nano-domain single dot of 5.1 nm in diameter and artificial nano-domain dot-array with a memory density of 10.1 Tbit/inch2 and a bit spacing of 8.0 nm, representing the highest memory density for rewritable data storage reported to date.
描述了基于扫描非线性介电显微镜(SNDM)的超高密度铁电数据存储研究。为了获取高密度铁电数据存储的基础知识,在钽酸锂(LiTaO₃)单晶中进行了关于纳米畴形成的多项实验。通过畴工程,在同成分钽酸锂(CLT)上形成了面密度为1.5 Tbit/英寸²的畴点阵列。还实现了亚纳秒(500皮秒)的畴切换速度。接下来,展示了密度为1 Tbit/英寸²的实际信息存储。最后,描述了施加非常小的直流偏置电压在加速畴切换速度和稳定反向纳米畴点方面非常有效。应用这种偏置施加技术,我们形成了直径为5.1 nm的最小人工纳米畴单点以及存储密度为10.1 Tbit/英寸²且位间距为8.0 nm的人工纳米畴点阵列,这代表了迄今为止报道的可重写数据存储的最高存储密度。