Gauvin Raynald, Lifshin Eric, Demers Hendrix, Horny Paula, Campbell Helen
Department of Metals and Materials Engineering, McGill University, Montréal, Québec H3A 2B2, Canada.
Microsc Microanal. 2006 Feb;12(1):49-64. doi: 10.1017/S1431927606060089.
A new Monte Carlo program, Win X-ray, is presented that predicts X-ray spectra measured with an energy dispersive spectrometer (EDS) attached to a scanning electron microscope (SEM) operating between 10 and 40 keV. All the underlying equations of the Monte Carlo simulation model are included. By simulating X-ray spectra, it is possible to establish the optimum conditions to perform a specific analysis as well as establish detection limits or explore possible peak overlaps. Examples of simulations are also presented to demonstrate the utility of this new program. Although this article concentrates on the simulation of spectra obtained from what are considered conventional thick samples routinely explored by conventional microanalysis techniques, its real power will be in future refinements to address the analysis of sample classifications that include rough surfaces, fine structures, thin films, and inclined surfaces because many of these can be best characterized by Monte Carlo methods. The first step, however, is to develop, refine, and validate a viable Monte Carlo program for simulating spectra from conventional samples.
介绍了一种新的蒙特卡罗程序Win X射线,它可以预测使用附着在工作电压为10至40 keV的扫描电子显微镜(SEM)上的能量色散谱仪(EDS)测得的X射线光谱。蒙特卡罗模拟模型的所有基本方程都包含在内。通过模拟X射线光谱,可以确定进行特定分析的最佳条件,以及确定检测限或探索可能的峰重叠。还给出了模拟示例,以证明这个新程序的实用性。虽然本文主要集中于模拟从常规微分析技术常规探测的传统厚样品获得的光谱,但其真正的优势将在于未来的改进,以解决包括粗糙表面、精细结构、薄膜和倾斜表面在内的样品分类分析问题,因为其中许多样品可以通过蒙特卡罗方法得到最佳表征。然而,第一步是开发、完善和验证一个可行的蒙特卡罗程序,用于模拟常规样品的光谱。