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结合蒙特卡罗模拟的X射线微分析用于层状薄膜分析:碳污染情况

X-ray microanalysis combined with monte carlo simulation for the analysis of layered thin films: the case of carbon contamination.

作者信息

Armigliato Aldo, Rosa Rodolfo

机构信息

CNR-IMM, Sezione di Bologna, Via P. Gobetti 101, 40129 Bologna, Italy.

出版信息

Microsc Microanal. 2009 Apr;15(2):99-105. doi: 10.1017/S1431927609090199.

Abstract

A previously developed Monte Carlo code has been extended to the X-ray microanalysis in a (scanning) transmission electron microscope of plan sections, consisting of bilayers and triple layers. To test the validity of this method for quantification purposes, a commercially available NiOx (x 1) thin film, deposited on a carbon layer, has been chosen. The composition and thickness of the NiO film and the thickness of the C support layer are obtained by fitting to the three X-ray intensity ratios I(NiK)/I(OK), I(NiK)/I(CK), and I(OK)/I(CK). Moreover, it has been investigated to what extent the resulting film composition is affected by the presence of a contaminating carbon film at the sample surface. To this end, the sample has been analyzed both in the (recommended) "grid downward" geometry and in the upside/down ("grid upward") situation. It is found that a carbon contaminating film of few tens of nanometers must be assumed in both cases, in addition to the C support film. Consequently, assuming the proper C/NiOx/C stack in the simulations, the Monte Carlo method yields the correct oxygen concentration and thickness of the NiOx film.

摘要

先前开发的蒙特卡罗代码已扩展到用于对由双层和三层组成的平面截面的(扫描)透射电子显微镜中的X射线微分析。为了测试该方法用于定量目的的有效性,选择了一种沉积在碳层上的市售NiOx(x 1)薄膜。通过拟合三个X射线强度比I(NiK)/I(OK)、I(NiK)/I(CK)和I(OK)/I(CK),获得了NiO薄膜的成分和厚度以及C支撑层的厚度。此外,还研究了样品表面存在污染碳膜时,所得薄膜成分受影响的程度。为此,对样品在(推荐的)“网格向下”几何结构和上下颠倒(“网格向上”)情况下都进行了分析。结果发现,除了C支撑膜外,在这两种情况下都必须假定存在几十纳米的碳污染膜。因此,在模拟中假设适当的C/NiOx/C堆叠结构,蒙特卡罗方法就能得出正确的NiOx薄膜的氧浓度和厚度。

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