Suppr超能文献

纳米多孔低介电常数电介质薄膜成像:用于透射电子显微镜的超薄切片术与聚焦离子束制备方法的比较

Imaging thin films of nanoporous low-k dielectrics: comparison between ultramicrotomy and focused ion beam preparations for transmission electron microscopy.

作者信息

Thompson Leslie E, Rice Philip M, Delenia Eugene, Lee Victor Y, Brock Phillip J, Magbitang Teddie P, Dubois Geraud, Volksen Willi, Miller Robert D, Kim Ho-Cheol

机构信息

IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120-6099, USA.

出版信息

Microsc Microanal. 2006 Apr;12(2):156-9. doi: 10.1017/S1431927606060041.

Abstract

Ultramicrotomy, the technique of cutting nanometers-thin slices of material using a diamond knife, was applied to prepare transmission electron microscope (TEM) specimens of nanoporous poly(methylsilsesquioxane) (PMSSQ) thin films. This technique was compared to focused ion beam (FIB) cross-section preparation to address possible artifacts resulting from deformation of nanoporous microstructure during the sample preparation. It was found that ultramicrotomy is a successful TEM specimen preparation method for nanoporous PMSSQ thin films when combined with low-energy ion milling as a final step. A thick, sacrificial carbon coating was identified as a method of reducing defects from the FIB process which included film shrinkage and pore deformation.

摘要

超薄切片技术是一种使用金刚石刀切割纳米级薄片材料的技术,被应用于制备纳米多孔聚(甲基倍半硅氧烷)(PMSSQ)薄膜的透射电子显微镜(TEM)标本。该技术与聚焦离子束(FIB)横截面制备方法进行了比较,以解决样品制备过程中纳米多孔微观结构变形可能产生的伪像。结果发现,当结合低能离子研磨作为最后一步时,超薄切片技术是制备纳米多孔PMSSQ薄膜TEM标本的一种成功方法。一种厚的牺牲性碳涂层被确定为减少FIB过程中缺陷的方法,这些缺陷包括薄膜收缩和孔隙变形。

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验