Maikisch Jonathan S, Gaylord Thomas K
School of Electrical and Computer Engineering and Microelectronics Research Center, Georgia Institute of Technology, Atlanta, Georgia 30332-0250, USA.
Appl Opt. 2007 Jun 20;46(18):3674-81. doi: 10.1364/ao.46.003674.
Using a combination of rigorous coupled-wave analysis and simulated annealing, parallel-face slanted surface-relief gratings (PFSSRGs) are optimized. For substrate-mode optical interconnects, profiles are presented for both polymer and silicon PFSSRGs for both TE and TM polarizations at normal incidence with grating periods designed to give a 45 degrees output angle in the negative-first forward-diffracted order. The resulting diffraction efficiencies range from 70% to 99%, with a majority of the optimized profiles yielding over 90%. Optimized polymer profiles for TE and TM polarizations exhibit similar high diffraction efficiencies, but the TM profiles generally require greater groove depths. Silicon profiles optimized for TM polarization have greater diffraction efficiencies than those for TE polarization. Profiles that can feasibly be fabricated are identified, and sensitivities to groove depth, filling factor, slant angle, and incident angle are shown to be modest.
通过结合严格耦合波分析和模拟退火算法，对平行面倾斜表面浮雕光栅（PFSSRGs）进行了优化。对于衬底模式光学互连，给出了聚合物和硅PFSSRGs在垂直入射时TE和TM偏振的轮廓，其光栅周期设计为在负一级前向衍射级中给出45度的输出角。所得衍射效率范围为70%至99%，大多数优化轮廓的衍射效率超过90%。TE和TM偏振的优化聚合物轮廓表现出相似的高衍射效率，但TM轮廓通常需要更大的槽深。针对TM偏振优化的硅轮廓比TE偏振的具有更高的衍射效率。确定了可行的可制造轮廓，并表明对槽深、填充因子、倾斜角和入射角的敏感度适中。
