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接触性过敏易感性的另一个特征:对弱接触性变应原的致敏与多致敏相关。IVDK的结果。

A further characteristic of susceptibility to contact allergy: sensitization to a weak contact allergen is associated with polysensitization. Results of the IVDK.

作者信息

Schnuch Axel, Brasch Jochen, Lessmann Holger, Geier Johannes, Uter Wolfgang

机构信息

Information Network of Departments of Dermatology (IVDK), University of Göttingen, Göttingen, Germany.

出版信息

Contact Dermatitis. 2007 Jun;56(6):331-7. doi: 10.1111/j.1600-0536.2007.01116.x.

Abstract

Although genetic factors probably account for differences in susceptibility to contact allergy, they have not yet been identified, partly due to an insufficient understanding of 'susceptibility'. Regarding polysensitization (PS) as a sign of increased susceptibility, we studied the relationship between PS and sensitization to weak versus strong allergens. Patch test data from 66,835 patients registered by the multicentre project, Information Network of Departments of Dermatology (IVDK) between 1 January 1997 and 31 December 2004, were analysed. The association between the number of sensitization to standard series allergens, and contact allergy to a strong allergen methyldibromoglutaronitrile (MDBGN) and to a weak allergen (paraben mix), was analysed with adjusted logistic regression analysis. In paraben-positive (++/+++) patients, the risk of > or = 2, > or = 3 or > or = 4 additional reactions were significantly increased by a factor of 2.1-4.6 compared to MDBGN-sensitized (++/+++) patients. Varying the basic model, a higher risk of additional positive reactions associated with paraben sensitization was consistently identified. The association between PS and sensitization to weak allergens adds a further characteristic of susceptibility to former findings of the IVDK, where PS was related to an increased risk of induction, elicitation, and cytokine polymorphisms. PS can be regarded as a phenotype to be considered in genetic studies.

摘要

尽管遗传因素可能是导致接触性过敏易感性差异的原因,但这些因素尚未得到确认,部分原因是对“易感性”的理解不足。我们将多致敏(PS)视为易感性增加的一个标志,研究了PS与对弱变应原和强变应原致敏之间的关系。分析了多中心项目皮肤科信息网络(IVDK)在1997年1月1日至2004年12月31日期间登记的66835例患者的斑贴试验数据。采用校正逻辑回归分析,分析对标准系列变应原的致敏数量与对强变应原甲基二溴戊二腈(MDBGN)和弱变应原(对羟基苯甲酸酯混合物)接触性过敏之间的关联。在对羟基苯甲酸酯阳性(++/+++)的患者中,与MDBGN致敏(++/+++)的患者相比,出现≥2次、≥3次或≥4次额外反应的风险显著增加2.1至4.6倍。改变基本模型后,始终发现与对羟基苯甲酸酯致敏相关的额外阳性反应风险更高。PS与对弱变应原致敏之间的关联为IVDK之前的研究结果增添了易感性的另一个特征,此前IVDK的研究发现PS与诱导、激发风险增加以及细胞因子多态性有关。PS可被视为基因研究中应考虑的一种表型。

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