Mayo S, Miller P, Gao D, Sheffield-Parker J
CSIRO Division of Materials Science and Engineering, Private Bag 33, Clayton South, VIC 3169, Australia.
J Microsc. 2007 Dec;228(Pt 3):257-63. doi: 10.1111/j.1365-2818.2007.01857.x.
Improved X-ray sources and optics now enable X-ray imaging resolution down to approximately 50 nm for laboratory-based X-ray microscopy systems. This offers the potential for submicrometre resolution in tomography; however, achieving this resolution presents challenges due to system stability. We describe the use of software methods to enable submicrometre resolution of approximately 560 nm. This is a very high resolution for a modest laboratory-based point-projection X-ray tomography system. The hardware is based on a scanning electron microscope, and benefits from inline X-ray phase contrast to improve visibility of fine features. Improving the resolution achievable with the system enables it to be used to address a greater range of samples.
如今,经过改进的X射线源和光学器件使得基于实验室的X射线显微镜系统的X射线成像分辨率可达约50纳米。这为断层扫描中的亚微米分辨率提供了可能;然而,由于系统稳定性的原因,要实现这一分辨率面临着挑战。我们描述了使用软件方法来实现约560纳米的亚微米分辨率。对于一个普通的基于实验室的点投影X射线断层扫描系统来说,这是非常高的分辨率。该硬件基于扫描电子显微镜,并受益于在线X射线相衬技术,以提高精细特征的可见性。提高该系统可实现的分辨率使其能够用于处理更多种类的样品。