Lee Byoung H, Ryu Min Ki, Choi Sung-Yool, Lee Kwang-H, Im Seongil, Sung Myung M
Department of Chemistry, Hanyang University, Seoul 133-791, Korea.
J Am Chem Soc. 2007 Dec 26;129(51):16034-41. doi: 10.1021/ja075664o. Epub 2007 Nov 30.
We report a new layer-by-layer growth method of self-assembled organic multilayer thin films based on gas-phase reactions. In the present molecular layer deposition (MLD) process, alkylsiloxane self-assembled multilayers (SAMs) were grown under vacuum by repeated sequential adsorptions of C=C-terminated alkylsilane and titanium hydroxide. The MLD method is a self- limiting layer-by-layer growth process, and is perfectly compatible with the atomic layer deposition (ALD) method. The SAMs films prepared exhibited good thermal and mechanical stability, and various unique electrical properties. The MLD method, combined with ALD, was applied to the preparation of organic-inorganic hybrid nanolaminate films in the ALD chamber. The organic-inorganic hybrid superlattices were then used as active mediums for two-terminal electrical bistable devices. The advantages of the MLD method with ALD include accurate control of film thickness, large-scale uniformity, highly conformal layering, sharp interfaces, and a vast library of possible materials. The MLD method with ALD is an ideal fabrication technique for various organic-inorganic hybrid superlattices.
我们报道了一种基于气相反应的自组装有机多层薄膜逐层生长新方法。在当前的分子层沉积（MLD）过程中，烷基硅氧烷自组装多层膜（SAMs）在真空中通过C = C端基烷基硅烷和氢氧化钛的重复顺序吸附生长。MLD方法是一种自限性的逐层生长过程，并且与原子层沉积（ALD）方法完全兼容。所制备的SAMs薄膜表现出良好的热稳定性和机械稳定性以及各种独特的电学性质。将MLD方法与ALD相结合，应用于在ALD腔室中制备有机-无机杂化纳米层状薄膜。然后将有机-无机杂化超晶格用作两端电双稳器件的活性介质。MLD与ALD结合的方法具有精确控制膜厚、大规模均匀性、高度共形分层、清晰界面以及大量可能材料库等优点。MLD与ALD结合的方法是制备各种有机-无机杂化超晶格的理想制造技术。
