Adamczyk N M, Dameron A A, George S M
Department of Chemistry and Biochemistry, University of Colorado, Boulder, Colorado 80309, USA.
Langmuir. 2008 Mar 4;24(5):2081-9. doi: 10.1021/la7025279. Epub 2008 Jan 24.
Ultrathin polymer films can be fabricated using the gas-phase method known as molecular layer deposition. This process typically uses bifunctional monomers in a sequential, self-limiting reaction sequence to grow conformal polymer films with molecular layer control. In this study, terephthaloyl chloride (TC) and p-phenylenediamine (PD) were used as the bifunctional monomers to deposit poly(p-phenylene terephthalamide) (PPTA) thin films. 3-Aminopropyl trimethoxysilane or ethanolamine was used to prepare amine-terminated surfaces prior to the PPTA MLD. The surface chemistry and growth rate during PPTA MLD at 145 degrees C were studied using in situ transmission Fourier transform infrared (FTIR) spectroscopy experiments on high surface area powders of SiO2 particles. PPTA MLD thin film growth at 145 degrees C was also examined using in situ transmission FTIR experiments on flat KBr substrates with an amine-terminated Al2O3 ALD overlayer. The integrated absorbances of the N-H and amide I stretching vibrations were measured and used to estimate the thin film thickness. X-ray reflectivity (XRR) experiments were also employed to measure the film thickness after PPTA MLD at 145 degrees C and 180 degrees C. The experiments revealed that the TC and PD reactions displayed self-limiting surface chemistry. The surface species alternated with sequential TC and PD exposures and the PPTA MLD films grew continuously. However, the growth rates per MLD cycle at 145 degrees C were less than expectations based on the size of the molecules involved in the reaction chemistry and were variable between 0.5 and 4.0 A per TC/PD reaction cycle. The lower growth rates are explained by the growth of a limited number of polymer chains on the substrate. The variability in the growth rate is attributed to the difficulties with the bifunctional monomer precursors. Alternative surface chemistries for polymer MLD are proposed that would avoid the use of bifunctional monomers.
超薄聚合物薄膜可以通过称为分子层沉积的气相法制备。该过程通常使用双功能单体,通过连续的自限性反应序列,以实现具有分子层控制的保形聚合物薄膜的生长。在本研究中,对苯二甲酰氯(TC)和对苯二胺(PD)被用作双功能单体来沉积聚对苯二甲酰对苯二胺(PPTA)薄膜。在进行PPTA分子层沉积之前,使用3-氨丙基三甲氧基硅烷或乙醇胺来制备胺基终止的表面。通过对高比表面积的二氧化硅颗粒粉末进行原位透射傅里叶变换红外(FTIR)光谱实验,研究了在145℃下PPTA分子层沉积过程中的表面化学和生长速率。还通过对具有胺基终止的氧化铝原子层沉积(ALD)覆盖层的平面溴化钾(KBr)衬底进行原位透射FTIR实验,研究了145℃下PPTA分子层沉积薄膜的生长情况。测量了N-H和酰胺I伸缩振动的积分吸光度,并用于估计薄膜厚度。还采用X射线反射率(XRR)实验来测量在145℃和180℃下进行PPTA分子层沉积后的薄膜厚度。实验表明,TC和PD反应表现出自限性表面化学。随着TC和PD的依次暴露,表面物种交替出现,并且PPTA分子层沉积薄膜持续生长。然而,基于反应化学中所涉及分子的大小,1