Lentzen Markus
Institute of Solid State Research, Ernst Ruska Centre for Microscopy and Spectroscopy with Electrons, Research Centre Jülich, 52425 Jülich, Germany.
Microsc Microanal. 2008 Feb;14(1):16-26. doi: 10.1017/S1431927608080045. Epub 2007 Dec 21.
The optimum imaging of an object structure at the sub-angstrom length scale requires precise adjustment of the lens aberrations of a high-resolution instrument up to the fifth order. A least-squares optimization of defocus aberration C1, third-order spherical aberration C3, and fifth-order spherical aberration C5 yields two sets of aberration coefficients for strong phase contrast up to the information limit: one for variable C1 and C3, at fixed C5, another for variable C1, C3, and C5. An additional correction to the defocus aberration, dependent on object thickness, is described, which becomes important for the use of image simulation programs in predicting optimum high-resolution contrast from thin objects at the sub-angstrom scale. For instruments with a sub-angstrom information limit the ultimate structure resolution, the power to resolve adjacent atom columns in a crystalline object, depends on both the instrumental pointspread and an object pointspread due to finite width of the atomic column potentials. A simulation study on a simple double-column model yields a range for structure resolutions, dependent on the atomic scattering power, from 0.070 nm down to 0.059 nm, for a hypothetical 300-kV instrument with an information limit of 0.050 nm.
要在亚埃长度尺度上对物体结构进行最佳成像,需要将高分辨率仪器的透镜像差精确调整到五阶。对离焦像差C1、三阶球差C3和五阶球差C5进行最小二乘优化,可得到两组直至信息极限的强相位对比度像差系数:一组是在固定C5时,C1和C3可变;另一组是C1、C3和C5均可变。文中描述了一种依赖于物体厚度的离焦像差的附加校正,这对于使用图像模拟程序预测亚埃尺度上薄物体的最佳高分辨率对比度非常重要。对于具有亚埃信息极限的仪器,最终的结构分辨率,即分辨晶体物体中相邻原子列的能力,取决于仪器的点扩散函数和由于原子列势的有限宽度导致的物体点扩散函数。对一个简单的双列模型进行的模拟研究得出,对于一台信息极限为0.050 nm的假设300 kV仪器,结构分辨率的范围取决于原子散射能力,从0.070 nm到0.059 nm。