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利用像差校正亚埃电子显微镜观察原子

Seeing atoms with aberration-corrected sub-Angström electron microscopy.

作者信息

O'Keefe Michael A

机构信息

Materials Science Division, National Center for Electron Microscopy, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720-8197, USA.

出版信息

Ultramicroscopy. 2008 Feb;108(3):196-209. doi: 10.1016/j.ultramic.2007.07.009. Epub 2007 Oct 18.

Abstract

High-resolution electron microscopy is able to provide atomic-level characterization of many materials in low-index orientations. To achieve the same level of characterization in more complex orientations requires that instrumental resolution be improved to values corresponding to the sub-Angström separations of atom positions projected into these orientations. Sub-Angström resolution in the high-resolution transmission electron microscope has been achieved in the last few years by software aberration correction, electron holography, and hardware aberration correction; the so-called "one-Angström barrier" has been left behind. Aberration correction of the objective lens currently allows atomic-resolution imaging at the sub-0.8A level and is advancing towards resolutions in the deep sub-Angström range (near 0.5A). At current resolution levels, images with sub-Rayleigh resolution require calibration in order to pinpoint atom positions correctly. As resolution levels approach the "sizes" of atoms, the atoms themselves will produce a limit to resolution, no matter how much the instrumental resolution is improved. By arranging imaging conditions suitably, each atom peak in the image can be narrower, so atoms are imaged smaller and may be resolved at finer separations.

摘要

高分辨率电子显微镜能够对许多低指数取向的材料进行原子级表征。要在更复杂的取向上实现相同水平的表征,需要将仪器分辨率提高到与投影到这些取向上的原子位置的亚埃级间距相对应的值。在过去几年中,通过软件像差校正、电子全息术和硬件像差校正,在高分辨率透射电子显微镜中实现了亚埃级分辨率;所谓的“一埃障碍”已被突破。物镜的像差校正目前允许在亚0.8埃水平进行原子分辨率成像,并正在朝着深亚埃范围(接近0.5埃)的分辨率迈进。在当前分辨率水平下,具有亚瑞利分辨率的图像需要进行校准,以便正确确定原子位置。随着分辨率水平接近原子的“大小”,无论仪器分辨率提高多少,原子本身都会对分辨率产生限制。通过适当地安排成像条件,图像中的每个原子峰可以更窄,因此原子成像更小,并且可以在更精细的间距下分辨。

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