Blum R-P, Niehus H, Hucho C, Fortrie R, Ganduglia-Pirovano M V, Sauer J, Shaikhutdinov S, Freund H-J
Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, Berlin 14195, Germany.
Phys Rev Lett. 2007 Nov 30;99(22):226103. doi: 10.1103/PhysRevLett.99.226103. Epub 2007 Nov 28.
In situ band gap mapping of the V2O5(001) crystal surface revealed a reversible metal-to-insulator transition at 350-400 K, which occurs inhomogeneously across the surface and expands preferentially in the direction of the vanadyl (V=O) double rows. Supported by density functional theory and Monte Carlo simulations, the results are rationalized on the basis of the anisotropic growth of vanadyl-oxygen vacancies and a concomitant oxygen loss driven metal-to-insulator transition at the surface. At elevated temperatures irreversible surface reduction proceeds sequentially as V2O5(001) --> V6O13(001) --> V2O3(0001).
V2O5(001) 晶体表面的原位带隙映射显示,在350 - 400 K 时发生可逆的金属 - 绝缘体转变,该转变在整个表面不均匀地发生,并且优先沿钒氧基(V = O)双行方向扩展。在密度泛函理论和蒙特卡罗模拟的支持下,基于钒氧基 - 氧空位的各向异性生长以及伴随的表面氧损失驱动的金属 - 绝缘体转变,对结果进行了合理解释。在高温下,不可逆的表面还原依次进行,即V2O5(001) --> V6O13(001) --> V2O3(0001) 。