Andersson Klas, Ketteler Guido, Bluhm Hendrik, Yamamoto Susumu, Ogasawara Hirohito, Pettersson Lars G M, Salmeron Miquel, Nilsson Anders
Stanford Synchrotron Radiation Laboratory, P.O.B. 20450, Stanford, California 94309, USA.
J Am Chem Soc. 2008 Mar 5;130(9):2793-7. doi: 10.1021/ja073727x. Epub 2008 Feb 8.
Autocatalytic dissociation of water on the Cu(110) metal surface is demonstrated on the basis of X-ray photoelectron spectroscopy studies carried out in situ under near ambient conditions of water vapor pressure (1 Torr) and temperature (275-520 K). The autocatalytic reaction is explained as the result of the strong hydrogen-bond in the H2O-OH complex of the dissociated final state, which lowers the water dissociation barrier according to the Brønsted-Evans-Polanyi relations. A simple chemical bonding picture is presented which predicts autocatalytic water dissociation to be a general phenomenon on metal surfaces.
基于在接近环境水汽压力（1托）和温度（275 - 520K）的条件下原位进行的X射线光电子能谱研究，证明了水在Cu(110)金属表面的自催化解离。自催化反应被解释为解离终态的H₂O - OH络合物中强氢键的结果，根据布朗斯特 - 埃文斯 - 波拉尼关系，该氢键降低了水的解离势垒。本文提出了一个简单的化学键合模型，预测自催化水分解是金属表面的普遍现象。
