Rafla-Yuan H, Rancourt J D, Cumbo M J
Appl Opt. 1997 Sep 1;36(25):6360-3. doi: 10.1364/ao.36.006360.
The optical properties of thermally evaporated germanium thin films in the spectral range 0.3-1.7 mum were studied with spectroscopic ellipsometry. The microstructure of these films, including their crystallinity, density, surface morphology, and surface oxidation, was analyzed with x-ray diffraction, Rutherford backscattering spectrometry, atomic force microscopy (AFM), and Auger electron spectrometry (AES). Parameters such as the surface roughness and surface-oxidation-layer thickness, derived from AFM and AES measurements, were incorporated into our optical model. The complex index of refraction (n and k) of the films was determined throughout the above spectral range and compared with that of single-crystal germanium.
利用光谱椭偏仪研究了热蒸发锗薄膜在0.3 - 1.7微米光谱范围内的光学性质。采用X射线衍射、卢瑟福背散射光谱法、原子力显微镜（AFM）和俄歇电子能谱（AES）对这些薄膜的微观结构进行了分析，包括它们的结晶度、密度、表面形貌和表面氧化情况。从AFM和AES测量中得出的诸如表面粗糙度和表面氧化层厚度等参数被纳入我们的光学模型。在上述整个光谱范围内测定了薄膜的复折射率（n和k），并与单晶锗的复折射率进行了比较。
