Lee Heeje, Ercoli Carlo, Funkenbusch Paul D, Feng Changyong
Department of Prosthodontics, Louisiana State University School of Dentistry, New Orleans, LA 70119, USA.
J Prosthet Dent. 2008 Feb;99(2):107-13. doi: 10.1016/S0022-3913(08)60026-8.
In some instances, an implant needs to be placed deep subgingivally, which may result in a less accurate impression of the implant. PURPOSE.: The purpose of this study was to evaluate the effect of subgingival depth of implant placement on the accuracy of implant impressions.
A stone master model was fabricated with 5 implant analogs (RN synOcta analog), embedded parallel to each other, at the center (E) and the 4 corners (A, B, C, and D). The vertical position of the shoulders of the implants was intentionally different among the implants: A and E were flush with the top surface of the model; B was 2 mm below, and C and D were 4 mm below the surface. The horizontal distances of implants A, B, C, and D from E were measured with a measuring microscope. A cross-shaped metal measuring bar was then fabricated and connected to E, with the arms of the casting designed to be 2 mm above the top surface of the model and incorporating a reference mark. With the measuring bar connected to E, the vertical distances from the apical surface of A, B, C, and D to the measuring reference marks were measured with a digital micrometer. The body of the impression coping for implant D was modified by adding 4 mm of additional impression coping, while standard impression copings were used for all other implants. Open tray impressions were made using medium-body polyether material (Impregum Penta) or a combination of putty and light-body vinyl polysiloxane (VPS) material (Elite HD+) (n=15). Then casts were poured with type IV dental stone. The vertical and horizontal distances of the casts were measured with the methods outlined above for the master model. The distortion values that were determined as differences between the measurements of the master model and those of the casts were collected for statistical analysis. Two-way and 1-way repeated measures ANOVA followed by Tukey's HSD test were performed to compare the distortion values (alpha=.05).
For vertical measurements, 2-way repeated measures ANOVA showed no significant depth (P=.36), material (P=.24), or interaction effects (P=.06). However, it showed significant depth effect for horizontal measurements (P=.01). Within the polyether group, 1-way repeated measures ANOVA showed significant differences in horizontal measurements among the implants with different depths (P=.03). The post hoc Tukey's test showed that the impression of 4-mm-deep implants with normal impression copings (C) was significantly less accurate than impressions of 0-mm-deep implants (A) (P=.02). Within the VPS group, there was no significant difference among the implants with different depths (P=.09).
There was no effect of implant depth on the accuracy of the VPS group. However, for the polyether group, the impression of an implant placed 4 mm subgingivally showed a greater horizontal distortion compared to an implant placed more coronally. Adding a 4-mm extension to the retentive part of the impression coping eliminated this difference.
在某些情况下,种植体需要植入龈下较深位置,这可能导致种植体印模的准确性降低。目的:本研究的目的是评估种植体植入龈下深度对种植体印模准确性的影响。
制作一个石膏母模,其中包含5个种植体代型(RN synOcta代型),它们相互平行嵌入,位于中心(E)以及4个角(A、B、C和D)。种植体肩部的垂直位置在各个种植体之间有意设置不同:A和E与模型顶面齐平;B在模型表面下方2mm,C和D在模型表面下方4mm。使用测量显微镜测量种植体A、B、C和D与E之间的水平距离。然后制作一个十字形金属测量杆并将其连接到E,铸造的臂设计为高于模型顶面2mm并带有一个参考标记。在测量杆连接到E的情况下,使用数字千分尺测量A、B、C和D的根尖表面到测量参考标记的垂直距离。对种植体D的印模帽主体进行修改,增加4mm的额外印模帽,而其他所有种植体使用标准印模帽。使用中稠度聚醚材料(Impregum Penta)或腻子和低稠度乙烯基聚硅氧烷(VPS)材料的组合(Elite HD +)制作开放托盘印模(n = 15)。然后用IV型牙科石膏灌注模型。使用上述用于母模的方法测量模型的垂直和水平距离。收集确定为主模测量值与模型测量值之间差异的变形值进行统计分析。进行双向和单向重复测量方差分析,然后进行Tukey's HSD检验以比较变形值(α = 0.05)。
对于垂直测量,双向重复测量方差分析显示深度(P = 0.36)、材料(P = 0.24)或交互作用均无显著影响(P = 0.06)。然而,对于水平测量,它显示出显著的深度效应(P = 0.01)。在聚醚组中,单向重复测量方差分析显示不同深度种植体的水平测量存在显著差异(P = 0.03)。事后Tukey检验表明,使用标准印模帽的4mm深种植体(C)的印模准确性明显低于0mm深种植体(A)的印模(P = 0.02)。在VPS组中,不同深度的种植体之间没有显著差异(P = 0.09)。
种植体深度对VPS组的准确性没有影响。然而,对于聚醚组,与植入位置更靠近冠方的种植体相比,植入龈下4mm的种植体印模显示出更大的水平变形。在印模帽的固位部分增加4mm的延伸部分消除了这种差异。