Kao T S, Fu Y H, Hsu H W, Tsai D P
Department of Physics, National Taiwan University, Taipei 10617, Taiwan.
J Microsc. 2008 Mar;229(Pt 3):561-6. doi: 10.1111/j.1365-2818.2008.01944.x.
Recently, use of nanostructured materials as a near-field optical active layer has attracted a lot of interest. The non-linear optical properties and strong enhancements of metallic oxide nanostructured thin films are key functions in applications of promising nanophotonics. For the importance of ultra-high density optical data storage, we continue investigating the ultra-high density recording property of near-field optical disk consisting of zinc oxide (ZnO(x)) nanostructured thin film. A carrier-to-noise ratio above 38 dB at a recording mark size of 100 nm can be obtained in the ZnO(x) near-field optical disk by a DVD driver tester directly. In this article, we use an optical pump-probe system (static media tester) to measure the optical response of a phase-change recording layer (Ge(2)Sb(2)Te(5)) and demonstrate the high contrast of optical recording with a ZnO(x) nanostructured thin film in short pulse durations. Also, we investigate the dependence of writing power and the optical response in conventional re-writable recording layers and the phase-change material with ZnO(x) nanostructured thin film.
最近,使用纳米结构材料作为近场光学活性层引起了广泛关注。金属氧化物纳米结构薄膜的非线性光学特性和强烈增强是有前途的纳米光子学应用中的关键功能。鉴于超高密度光学数据存储的重要性,我们继续研究由氧化锌(ZnO(x))纳米结构薄膜组成的近场光盘的超高密度记录特性。通过DVD驱动器测试仪可直接在ZnO(x)近场光盘中获得记录标记尺寸为100 nm时高于38 dB的载噪比。在本文中,我们使用光泵浦-探测系统(静态介质测试仪)来测量相变记录层(Ge(2)Sb(2)Te(5))的光学响应,并证明在短脉冲持续时间内用ZnO(x)纳米结构薄膜进行光学记录具有高对比度。此外,我们研究了写入功率以及传统可重写记录层和具有ZnO(x)纳米结构薄膜的相变材料中的光学响应之间的依赖关系。