Park S H, Jeon H, Sung Y J, Yeom G Y
Appl Opt. 2001 Aug 1;40(22):3698-702. doi: 10.1364/ao.40.003698.
We have fabricated refractive sapphire microlenses and characterized their properties for what we believe to be the first time. We use thermally reflown photoresist lenslet patterns as a mask for chlorine-based dry etch of sapphire. Pattern transfer to the mechanically hard and chemically inert sapphire substrate is made possible by an inductively coupled plasma etch system that supplies a high-density plasma gas. Processed sapphire microlenses exhibit properties close to the ideal and operate nearly in the diffraction limit.
我们首次制造了折射蓝宝石微透镜并对其特性进行了表征。我们使用热回流光刻胶小透镜图案作为蓝宝石氯基干法蚀刻的掩膜。通过提供高密度等离子体气体的电感耦合等离子体蚀刻系统，能够将图案转移到机械硬度高且化学性质惰性的蓝宝石衬底上。加工后的蓝宝石微透镜展现出接近理想的特性，并且几乎在衍射极限下工作。
