Scaringi M, Temperani P, Rossi P, Bravo G, Gobba F
Cattedra di Medicina del Lavoro, Dipartimento di Scienze di Sanità Pubblica, Università di Modena e Reggio Emilia, Modena, Italy.
G Ital Med Lav Ergon. 2007 Jul-Sep;29(3 Suppl):420-1.
Whether or not ELF-MF has genotoxic potential is a controversial issue. In the present study, we investigated the genotoxic effect using cytogenetic assays (CA - SCE - MN), in 109 workers exposed to ELF-MF. The mean value of occupational exposure in the whole group was 0.35 microT. According to the exposure level the workers were stratified in two different groups: low exposed (n. 39, TWA < or = 0.2 microT) and higher exposed (n. 70; TWA > 0.2 microT): the groups did not significantly differ for the examined variables. Due to these results we decided to re-evaluate the effect only considering the highest exposed workers: we selected 31 workers exposed to TWA levels exceeding 1 microT, and compared vs. the low exposed subjects: again, the difference in the groups examined were not significant. At multivariate regression analysis was also applied: no correlation was observed with cytogenetic biomarkers. The results of this study does not support the hypothesis of any direct genotoxic effect of ELF-MF, at least at the environmental levels currently found in an occupational settings.
极低频磁场(ELF-MF)是否具有遗传毒性潜力是一个有争议的问题。在本研究中,我们使用细胞遗传学检测方法(染色体畸变 - 姐妹染色单体交换 - 微核试验,CA - SCE - MN)对109名暴露于ELF-MF的工人进行了遗传毒性效应调查。整个组的职业暴露平均值为0.35微特斯拉。根据暴露水平,将工人分为两个不同的组:低暴露组(n = 39,时间加权平均暴露量(TWA)≤0.2微特斯拉)和高暴露组(n = 70;TWA>0.2微特斯拉):这两组在所检查的变量方面没有显著差异。基于这些结果,我们决定仅考虑高暴露工人来重新评估效应:我们选择了31名暴露于TWA水平超过1微特斯拉的工人,并与低暴露受试者进行比较:同样,所检查组之间的差异不显著。还进行了多变量回归分析:未观察到与细胞遗传学生物标志物的相关性。本研究结果不支持ELF-MF具有任何直接遗传毒性效应的假设,至少在目前职业环境中发现的环境水平下是如此。