用近场微波微探针表征Alq3薄膜。

Characterization of Alq3 thin films by a near-field microwave microprobe.

作者信息

Hovsepyan Artur, Lee Huneung, Sargsyan Tigran, Melikyan Harutyun, Yoon Youngwoon, Babajanyan Arsen, Friedman Barry, Lee Kiejin

机构信息

Department of Physics and Interdisciplinary Program of Integrated Biotechnology, Sogang University, Seoul 121-742, Republic of Korea.

出版信息

Ultramicroscopy. 2008 Sep;108(10):1058-61. doi: 10.1016/j.ultramic.2008.04.013. Epub 2008 May 3.

DOI:10.1016/j.ultramic.2008.04.013

PMID:18547735

Abstract

We observed tris-8-hydroxyquinoline aluminum (Alq3) thin films dependence on substrate heating temperatures by using a near-field microwave microprobe (NFMM) and by optical absorption at wavelengths between 200 and 900 nm. The changes of absorption intensity at different substrate heating temperatures are correlated to the changes in the sheet resistance of Alq3 thin films.

摘要

我们通过使用近场微波微探针（NFMM）以及在200至900纳米波长之间的光吸收，观察了三（8-羟基喹啉）铝（Alq3）薄膜对衬底加热温度的依赖性。不同衬底加热温度下吸收强度的变化与Alq3薄膜薄层电阻的变化相关。