Mancini Michael C, Kairdolf Brad A, Smith Andrew M, Nie Shuming
Department of Biomedical Engineering, Emory University, 101 Woodruff Circle, WMB Suite 2007, Atlanta, Georgia 30322, USA.
J Am Chem Soc. 2008 Aug 20;130(33):10836-7. doi: 10.1021/ja8040477. Epub 2008 Jul 25.
We report quenching and chemical degradation of polymer-coated quantum dots by reactive oxygen species (ROS), a group of oxygen-containing molecules that are produced by cellular metabolism and are involved in both normal physiological and disease processes such as oxidative signaling, cancer, and atherosclerosis. A major new finding is that hypochlorous acid (HOCl) in its neutral form is especially potent in degrading encapsulated QDs, due to its small size, neutral charge, long half-life, and fast reaction kinetics under physiologic conditions. Thus, small and neutral molecules such as HOCl and hydrogen peroxide (H2O2) are believed to diffuse across the polymer coating layer, leading to chemical oxidation of sulfur or selenium atoms on the QD surface. This "etching" process first generates lattice structural defects (which cause fluorescence quenching) and then produces soluble metal (e.g., cadmium and zinc) and chalcogenide (e.g., sulfur and selenium) species. We also find that significant fluorescence quenching occurs before QD dissolution and that localized surface defects can be repaired or "annealed" by UV light illumination. These results have important implications regarding the long-term fate and potential toxicity of semiconductor nanocrystals in vivo.
我们报道了活性氧(ROS)对聚合物包覆量子点的淬灭和化学降解作用,ROS是一类含氧化合物分子,由细胞代谢产生,参与正常生理过程以及诸如氧化信号传导、癌症和动脉粥样硬化等疾病过程。一项主要的新发现是,中性形式的次氯酸(HOCl)在降解包封的量子点方面特别有效,这归因于其体积小、呈中性电荷、半衰期长以及在生理条件下反应动力学快。因此,诸如HOCl和过氧化氢(H2O2)等小的中性分子被认为可扩散穿过聚合物涂层,导致量子点表面的硫或硒原子发生化学氧化。这种“蚀刻”过程首先产生晶格结构缺陷(导致荧光淬灭),然后产生可溶性金属(如镉和锌)和硫族化物(如硫和硒)物种。我们还发现,在量子点溶解之前会发生显著的荧光淬灭,并且局部表面缺陷可通过紫外光照射进行修复或“退火”。这些结果对于半导体纳米晶体在体内的长期归宿和潜在毒性具有重要意义。