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Superhydrophobic and low light reflectivity silicon surfaces fabricated by hierarchical etching.

作者信息

Xiu Yonghao, Zhang Shu, Yelundur Vijay, Rohatgi Ajeet, Hess Dennis W, Wong C P

机构信息

School of Chemical and Biomolecular Engineering, Georgia Institute of Technology, 311 Ferst Drive, Atlanta, GA 30332-0100, USA.

出版信息

Langmuir. 2008 Sep 16;24(18):10421-6. doi: 10.1021/la801206m. Epub 2008 Aug 19.

DOI:10.1021/la801206m
PMID:18710271
Abstract

Silicon is employed in a variety of electronic and optical devices such as integrated circuits, photovoltaics, sensors, and detectors. In this paper, Au-assisted etching of silicon has been used to prepare superhydrophobic surfaces that may add unique properties to such devices. Surfaces were characterized by contact angle and contact angle hysteresis. Superhydrophobic surfaces with reduced hysteresis were prepared by Au-assisted etching of pyramid-structured silicon surfaces to generate hierarchical surfaces. Consideration of the Laplace pressure on hydrophobized hierarchical surfaces gives insight into the manner by which contact is established at the liquid/composite surface interface. Light reflectivity from the etched surfaces was also investigated to assess application of these structures to photovoltaic devices.

摘要

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