Ishikura Nobuyuki, Fujii Minoru, Nishida Kohei, Hayashi Shinji, Diener Joachim
Department of Electrical and Electronic Engineering, Graduate School of Engineering, Kobe University, Rokkodai, Nada, Kobe 657-8501, Japan.
Opt Express. 2008 Sep 29;16(20):15531-9. doi: 10.1364/oe.16.015531.
Rugate filters made of anisotropically nanostructured birefringent silicon have been fabricated and studied by polarization-resolved transmission measurements. Electrochemical etching of a (110) oriented Si wafer results in porous silicon layers which exhibit a strong in-plane birefringence. We demonstrate that a sinusoidal refractive index variation of birefringent porous silicon combined with index-matching layers and apodization results in a dichroic rugate filter having a stop-band dependent on the polarization direction of the incident light without higher-order harmonics and sidelobes. We also demonstrate that the combination of different dichroic rugate filters allow us to realize filters with more complex properties in a single preparation step.
由各向异性纳米结构双折射硅制成的rugate滤波器已通过偏振分辨透射测量进行了制备和研究。对(110)取向的硅晶片进行电化学蚀刻会产生具有强面内双折射的多孔硅层。我们证明,双折射多孔硅的正弦折射率变化与折射率匹配层和切趾相结合,会产生一种二向色性rugate滤波器,其阻带取决于入射光的偏振方向,且没有高阶谐波和旁瓣。我们还证明,不同二向色性rugate滤波器的组合使我们能够在单个制备步骤中实现具有更复杂特性的滤波器。