Hashempour M, Mashreghian Arani Z, Lombardi F
Department of ECE, Northeastern University, Boston, MA 02115, USA.
IET Nanobiotechnol. 2008 Dec;2(4):81-92. doi: 10.1049/iet-nbt:20080002.
An assessment of the effectiveness of healing for error tolerance in DNA self-assembly tile sets for algorithmic/nano-manufacturing applications is presented. Initially, the conditions for correct binding of a tile to an existing aggregate are analysed using a Markovian approach; based on this analysis, it is proved that correct aggregation (as identified with a so-called ideal tile set) is not always met for the existing tile sets for nano-manufacturing. A metric for assessing tile sets for healing by utilising punctures is proposed. Tile sets are investigated and assessed with respect to features such as error (mismatched tile) movement, punctured area and bond types. Subsequently, it is shown that the proposed metric can comprehensively assess the healing effectiveness of a puncture type for a tile set and its capability to attain error tolerance for the desired pattern. Extensive simulation results are provided.
本文对用于算法/纳米制造应用的DNA自组装瓦片集的容错修复有效性进行了评估。首先，使用马尔可夫方法分析瓦片与现有聚集体正确结合的条件；基于此分析，证明了对于现有的纳米制造瓦片集，并不总是能实现正确聚集（如用所谓的理想瓦片集所确定的）。提出了一种利用穿孔来评估瓦片集修复能力的指标。针对诸如错误（不匹配瓦片）移动、穿孔区域和键合类型等特征对瓦片集进行了研究和评估。随后，结果表明所提出的指标能够全面评估瓦片集的穿孔类型的修复有效性及其实现所需图案容错的能力。提供了大量的模拟结果。
