Kirk T L, De Pietro L G, Pescia D, Ramsperger U
Laboratorium für Festkörperphysik, Eidgenössische Technische Hochschule Zürich (ETH), CH-8093 Zürich, Switzerland.
Ultramicroscopy. 2009 Apr;109(5):463-6. doi: 10.1016/j.ultramic.2008.11.009. Epub 2008 Nov 27.
In conventional scanning electron microscopy (SEM), the lateral resolution is limited by the electron beam diameter impinging on the specimen surface. Near field emission scanning electron microscopy (NFESEM) provides a simple means of overcoming this limit; however, the most suitable field emitter remains to be determined. NFESEM has been used in this work to investigate the W (110) surface with single-crystal tungsten tips of (310), (111), and (100)-orientations. The topographic images generated from both the electron intensity variations and the field emission current indicate higher resolution capabilities with decreasing tip work function than with polycrystalline tungsten tips. The confinement of the electron beam transcends the resolution limitations of the geometrical models, which are determined by the minimum beam width.
在传统扫描电子显微镜（SEM）中，横向分辨率受撞击样品表面的电子束直径限制。近场发射扫描电子显微镜（NFESEM）提供了一种克服此限制的简单方法；然而，最合适的场发射体仍有待确定。在本工作中，已使用NFESEM通过（310）、（111）和（100）取向的单晶钨尖端研究W（110）表面。由电子强度变化和场发射电流生成的形貌图像表明，与多晶钨尖端相比，随着尖端功函数降低，分辨率能力更高。电子束的限制超越了由最小束宽决定的几何模型的分辨率限制。
