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用于电磁兼容性去耦的薄膜铁电电容器的性能

Performance of thin-film ferroelectric capacitors for EMC decoupling.

作者信息

Li Huadong, Subramanyam Guru

机构信息

Department of Electrical and Computer Engineering, University of Dayton, OH, USA.

出版信息

IEEE Trans Ultrason Ferroelectr Freq Control. 2008 Dec;55(12):2552-8. doi: 10.1109/TUFFC.2008.971.

Abstract

This paper studied the effects of thin-film ferroelectrics as decoupling capacitors for electromagnetic compatibility applications. The impedance and insertion loss of PZT capacitors were measured and compared with the results from commercial off-the-shelf capacitors. An equivalent circuit model was extracted from the experimental results, and a considerable series resistance was found to exist in ferroelectric capacitors. This resistance gives rise to the observed performance difference around series resonance between ferroelectric PZT capacitors and normal capacitors. Measurements on paraelectric (Ba,Sr)TiO(3)-based integrated varactors do not show this significant resistance. Some analyses were made to investigate the mechanisms, and it was found that it can be due to the hysteresis in the ferroelectric thin films.

摘要

本文研究了薄膜铁电体作为去耦电容器在电磁兼容性应用中的效果。测量了PZT电容器的阻抗和插入损耗,并与市售现成电容器的结果进行了比较。从实验结果中提取了一个等效电路模型,发现铁电电容器中存在相当大的串联电阻。该电阻导致了铁电PZT电容器与普通电容器在串联谐振附近观察到的性能差异。对顺电体(Ba,Sr)TiO(3)基集成变容二极管的测量未显示出这种显著电阻。进行了一些分析来研究其机制,发现这可能是由于铁电薄膜中的滞后现象。

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