Jiang Yong, Rabbi Mahir, Kim Minkyu, Ke Changhong, Lee Whasil, Clark Robert L, Mieczkowski Piotr A, Marszalek Piotr E
Center for Biologically Inspired Materials and Material Systems, Duke University, Durham, North Carolina, USA.
Biophys J. 2009 Feb;96(3):1151-8. doi: 10.1016/j.bpj.2008.10.030.
There is increasing evidence that UVA radiation, which makes up approximately 95% of the solar UV light reaching the Earth's surface and is also commonly used for cosmetic purposes, is genotoxic. However, in contrast to UVC and UVB, the mechanisms by which UVA produces various DNA lesions are still unclear. In addition, the relative amounts of various types of UVA lesions and their mutagenic significance are also a subject of debate. Here, we exploit atomic force microscopy (AFM) imaging of individual DNA molecules, alone and in complexes with a suite of DNA repair enzymes and antibodies, to directly quantify UVA damage and reexamine its basic mechanisms at a single-molecule level. By combining the activity of endonuclease IV and T4 endonuclease V on highly purified and UVA-irradiated pUC18 plasmids, we show by direct AFM imaging that UVA produces a significant amount of abasic sites and cyclobutane pyrimidine dimers (CPDs). However, we find that only approximately 60% of the T4 endonuclease V-sensitive sites, which are commonly counted as CPDs, are true CPDs; the other 40% are abasic sites. Most importantly, our results obtained by AFM imaging of highly purified native and synthetic DNA using T4 endonuclease V, photolyase, and anti-CPD antibodies strongly suggest that CPDs are produced by UVA directly. Thus, our observations contradict the predominant view that as-yet-unidentified photosensitizers are required to transfer the energy of UVA to DNA to produce CPDs. Our results may help to resolve the long-standing controversy about the origin of UVA-produced CPDs in DNA.
越来越多的证据表明,占到达地球表面的太阳紫外线约95%且常用于美容目的的UVA辐射具有基因毒性。然而,与UVC和UVB不同,UVA产生各种DNA损伤的机制仍不清楚。此外,各种类型的UVA损伤的相对数量及其诱变意义也是一个有争议的话题。在这里,我们利用原子力显微镜(AFM)对单个DNA分子进行成像,单独成像以及与一系列DNA修复酶和抗体形成复合物后的成像,以直接量化UVA损伤并在单分子水平上重新审视其基本机制。通过结合核酸内切酶IV和T4核酸内切酶V对高度纯化且经UVA照射的pUC18质粒的活性,我们通过直接AFM成像表明,UVA会产生大量的无碱基位点和环丁烷嘧啶二聚体(CPD)。然而,我们发现,通常被计为CPD的T4核酸内切酶V敏感位点中,只有约60%是真正的CPD;另外40%是无碱基位点。最重要的是,我们使用T4核酸内切酶V、光解酶和抗CPD抗体对高度纯化的天然和合成DNA进行AFM成像所获得的结果强烈表明,CPD是由UVA直接产生的。因此,我们的观察结果与一种主流观点相矛盾,该观点认为需要尚未确定的光敏剂将UVA能量转移到DNA上才能产生CPD。我们的结果可能有助于解决关于DNA中UVA产生的CPD起源的长期争议。