Chang S H, Lee J S, Chae S C, Lee S B, Liu C, Kahng B, Kim D-W, Noh T W
ReCOE&FPRD, Department of Physics and Astronomy, Seoul National University, Seoul 151-747, Korea.
Phys Rev Lett. 2009 Jan 16;102(2):026801. doi: 10.1103/PhysRevLett.102.026801. Epub 2009 Jan 12.
We observed two types of reversible resistance switching (RS) effects in a NiO film: memory RS at low temperature and threshold RS at high temperature. We were able to control the type of RS effects by thermal cycling. These phenomena were explained using a new dynamic percolation model that can describe the rupture and formation of conducting filaments. We showed that the RS effects are governed by the thermal stability of the filaments, which arise from competition between Joule heating and thermal dissipation. This work provides us understandings on basic mechanism of the RS effects and their interrelation.
我们在氧化镍薄膜中观察到两种类型的可逆电阻开关(RS)效应:低温下的记忆电阻开关和高温下的阈值电阻开关。我们能够通过热循环来控制电阻开关效应的类型。利用一种新的动态渗流模型对这些现象进行了解释,该模型可以描述导电细丝的断裂和形成。我们表明,电阻开关效应受细丝热稳定性的支配,而细丝热稳定性源于焦耳热和热耗散之间的竞争。这项工作为我们提供了对电阻开关效应的基本机制及其相互关系的理解。