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萎缩芽孢杆菌孢子萌发与杀灭的原子力显微镜研究

Atomic force microscopy study of germination and killing of Bacillus atrophaeus spores.

作者信息

Pinzón-Arango Paola A, Scholl Geoffrey, Nagarajan Ramanathan, Mello Charlene M, Camesano Terri A

机构信息

Department of Chemical Engineering, Worcester Polytechnic Institute, Worcester, MA 01609, USA.

出版信息

J Mol Recognit. 2009 Sep-Oct;22(5):373-9. doi: 10.1002/jmr.945.

Abstract

Bacterial spores such as Bacillus atrophaeus are one of the most resistant life forms known and are extremely resistant to chemical and environmental factors in the dormant state. During germination, as bacterial spores progress towards the vegetative state, they become susceptible to anti-sporal agents. B. atrophaeus spores were exposed to the non-nutritive germinant dodecylamine (DDA), a cationic surfactant that can also be used as a killing agent, for up to 60 min, or to the nutrient germinant L-alanine. In kinetic studies, 99% of the spores were killed within 5 min of exposure to DDA. Atomic force microscopy (AFM) can be used as a sensitive tool to assess how the structure of the spore coat changes upon exposure to germinants or killing agents. Changes in cell height and roughness over time of exposure to DDA were examined using AFM. DDA caused the spore height to decrease by >50%, which may have been due to a partial breakdown of the spore coat. Treatment of B. atrophaeus with the nutrient germinant resulted in a decrease in height of spores after 2 h of incubation, from 0.7 +/- 0.1 microm to 0.3 +/- 0.2 microm. However, treatment with L-alanine did not change the surface roughness of the spores, indicating that the changes that occur during germination take place underneath the spore coat. We propose that exposure to DDA at high concentrations causes pores to form in the coat layer, killing B. atrophaeus without the need to fully germinate spores.

摘要

诸如萎缩芽孢杆菌之类的细菌孢子是已知的最具抗性的生命形式之一,在休眠状态下对化学和环境因素具有极强的抵抗力。在萌发过程中,随着细菌孢子向营养状态转变,它们会变得易受抗孢子剂的影响。将萎缩芽孢杆菌孢子暴露于非营养萌发剂十二烷基胺(DDA)(一种也可用作杀菌剂的阳离子表面活性剂)中长达60分钟,或暴露于营养萌发剂L-丙氨酸中。在动力学研究中,99%的孢子在暴露于DDA的5分钟内被杀死。原子力显微镜(AFM)可作为一种灵敏工具,用于评估孢子外壁在暴露于萌发剂或杀菌剂后结构如何变化。使用AFM检测了暴露于DDA过程中细胞高度和粗糙度随时间的变化。DDA导致孢子高度降低超过50%,这可能是由于孢子外壁部分分解所致。用营养萌发剂处理萎缩芽孢杆菌后,孵育2小时后孢子高度从0.7±0.1微米降至0.3±0.2微米。然而,用L-丙氨酸处理并未改变孢子的表面粗糙度,这表明萌发过程中发生的变化发生在孢子外壁之下。我们提出,高浓度暴露于DDA会导致外壁层形成孔隙,从而杀死萎缩芽孢杆菌,而无需孢子完全萌发。

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