Zuppella P, Luciani D, Tucceri P, De Marco P, Gaudieri A, Kaiser J, Ottaviano L, Santucci S, Reale A
Dipartimento di Fisica, Università dell'Aquila, L'Aquila, Italy.
Nanotechnology. 2009 Mar 18;20(11):115303. doi: 10.1088/0957-4484/20/11/115303. Epub 2009 Feb 24.
A prototype low cost table-top Ar capillary discharge laser source (1.5 ns pulse duration, lambda = 46.9 nm) was successfully used to produce, by means of interference lithography (with a simple Lloyd mirror setup), large area (0.1 mm(2)) regular patterns from 400 nm down to 22.5 nm (half-pitch) on PMMA/Si (PMMA: polymethylmethacrylate) substrates. The experiments allowed a systematical investigation of the degree of mutual coherence of the source, giving a clear indication that the interference lithography can be pushed down to the ultimate resolution limit of lambda/4.
一种低成本的桌面式氩毛细管放电激光源原型（脉冲持续时间为1.5纳秒，波长λ = 46.9纳米）通过干涉光刻技术（采用简单的洛埃镜装置），成功地在聚甲基丙烯酸甲酯/硅（PMMA：聚甲基丙烯酸甲酯）衬底上制作出了大面积（0.1平方毫米）、间距从400纳米至22.纳米（半间距）的规则图案。这些实验使得对该光源的相互相干程度进行系统研究成为可能，明确表明干涉光刻技术能够被推进到λ/4的极限分辨率。
