Porrati F, Sachser R, Huth M
Physikalisches Institut, Goethe-Universität, Frankfurt am Main, Germany.
Nanotechnology. 2009 May 13;20(19):195301. doi: 10.1088/0957-4484/20/19/195301. Epub 2009 Apr 20.
W-based granular metals have been prepared by electron-beam-induced deposition from the tungsten hexacarbonyl W(CO)(6) precursor. In situ electrical conductivity measurements have been performed to monitor the growth process and to investigate the behavior of the deposit under electron beam post-irradiation and by exposure to air. During the first part of the growth process, the electrical conductivity grows nonlinearly, independent of the electron beam parameters. This behavior is interpreted as the result of the increase of the W-particle's diameter. Once the growth process is terminated, the electrical conductivity decreases with the logarithm of time, sigma approximately ln(t). Temperature-dependent conductivity measurements of the deposits reveal that the electrical transport takes place by means of electron tunneling either between W-metal grains or between grains and trap sites in the matrix. After venting the electron microscope the electrical conductivity of the deposits shows a degradation behavior, which depends on the composition. Electron post-irradiation increases the electrical conductivity of the deposits.
基于钨的粒状金属是通过电子束诱导六羰基钨W(CO)₆前驱体沉积制备而成。已进行原位电导率测量,以监测生长过程,并研究沉积物在电子束后辐照及暴露于空气中的行为。在生长过程的第一阶段,电导率呈非线性增长,与电子束参数无关。这种行为被解释为钨颗粒直径增加的结果。一旦生长过程终止,电导率随时间的对数下降,σ≈ln(t)。对沉积物进行的温度依赖性电导率测量表明,电输运是通过钨金属颗粒之间或颗粒与基体中的陷阱位点之间的电子隧穿进行的。在电子显微镜排气后,沉积物的电导率表现出降解行为,这取决于其成分。电子后辐照会增加沉积物的电导率。