Herrmannsdörfer T, Heera V, Ignatchik O, Uhlarz M, Mücklich A, Posselt M, Reuther H, Schmidt B, Heinig K-H, Skorupa W, Voelskow M, Wündisch C, Skrotzki R, Helm M, Wosnitza J
Dresden High Magnetic Field Laboratory (HLD) and Institute of Ion Beam Physics and Materials Research, Forschungszentrum Dresden-Rossendorf (FZD), P.O. Box 51 01 19, D-01314 Dresden, Germany.
Phys Rev Lett. 2009 May 29;102(21):217003. doi: 10.1103/PhysRevLett.102.217003. Epub 2009 May 27.
We demonstrate that the third elemental group-IV semiconductor, germanium, exhibits superconductivity at ambient pressure. Using advanced doping and annealing techniques of state-of-the-art semiconductor processing, we have fabricated a highly Ga-doped Ge (GeratioGa) layer in near-intrinsic Ge. Depending on the detailed annealing conditions, we demonstrate that superconductivity can be generated and tailored in the doped semiconducting Ge host at temperatures as high as 0.5 K. Critical-field measurements reveal the quasi-two-dimensional character of superconductivity in the approximately 60 nm thick GeratioGa layer. The Cooper-pair density in GeratioGa appears to be exceptionally low.
我们证明,第三种元素族IV半导体锗在常压下表现出超导性。利用先进的掺杂和退火技术以及最先进的半导体加工工艺,我们在近本征锗中制备了高镓掺杂的锗(Ge比例Ga)层。根据详细的退火条件,我们证明在温度高达0.5K时,超导性可以在掺杂的半导体锗主体中产生并加以调控。临界场测量揭示了在约60nm厚的Ge比例Ga层中超导性的准二维特性。Ge比例Ga中的库珀对密度似乎异常低。