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溶质和氢离子浓度对某些嗜旱真菌水分关系的影响

Influence of solute and hydrogen ion concentration on the water relations of some xerophilic fungi.

作者信息

Pitt J I, Hocking A D

出版信息

J Gen Microbiol. 1977 Jul;101(1):35-40. doi: 10.1099/00221287-101-1-35.

Abstract

Germination and growth of six xerophilic fungi, Aspergillus flavus, Aspergillus ochraceus, Eurotium chevalieri, Chrysosphorium fastidium, Wallemia sebi and Xeromyces bisporus were examined on media of a wide range of water activities (aw). The influence of three solutes, NaCl, glycerol and a glucose/fructose mixture, was studied at pH 4-0 and pH 6-5 using a plate-slide technique. Germination times and growth rates were affected by solute type, but the influence of pH was less marked. Except for Wallemia sebi, the fungi grew most strongly on glucose/fructose and were partially or completely inhibited by NaCl. The results showed that a universal isolation medium for xerophilic fungi could be based on glycerol or glucose/fructose but not on NaCl as aw-limiting solute.

摘要

在一系列不同水分活度(aw)的培养基上,对六种嗜旱真菌——黄曲霉、赭曲霉、谢瓦曲霉、苛求金孢霉、西氏瓦勒霉和双孢嗜旱酵母的萌发和生长进行了研究。使用平板-载玻片技术,在pH 4.0和pH 6.5条件下,研究了三种溶质(氯化钠、甘油和葡萄糖/果糖混合物)的影响。萌发时间和生长速率受溶质类型的影响,但pH的影响不太明显。除西氏瓦勒霉外,这些真菌在葡萄糖/果糖上生长最为旺盛,并且受到氯化钠的部分或完全抑制。结果表明,一种用于嗜旱真菌的通用分离培养基可以基于甘油或葡萄糖/果糖,但不能以氯化钠作为限制水分活度的溶质。

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