Kim Sang-Mook, Park Tae-Young, Park Seong-Ju, Lee Seung-Jae, Baek Jong Hyeob, Park Yun Chang, Jung Gun Young
Department of Materials Science and Engineering, Gwangju Institute of Science and Technology (GIST), 1 Oryongdong, Buk-gu, Gwangju 500-712, Republic of Korea.
Opt Express. 2009 Aug 17;17(17):14791-9. doi: 10.1364/oe.17.014791.
Nanopatterned aluminum nitride (NP-AlN) templates were used to enhance the light extraction efficiency of the light-emitting diodes (LEDs). Here, the NP-AlN interlayer between the sapphire substrate and GaN-based LED was used as an effective light outcoupling layer at the direction of bottom side and as a buffer layer for growth of GaN LEDs. The cross-sectional transmission electron microscopy (TEM) analysis showed that the formation of stacking faults and voids could help reduce the threading dislocations. Micro Raman spectra also revealed that the GaN-based epilayer grown on the NP-AlN template had smaller residual stress than that grown on a planar sapphire substrate. The normalized electroluminescence (EL) spectra at the top and bottom sides of device revealed that the enhancement of the bottom side emission of the LED with the NP-AlN interlayer was more notable than a planar sapphire substrate due to the graded-refractive-index (GRIN) effect of the NP-AlN.
纳米图案化氮化铝(NP-AlN)模板被用于提高发光二极管(LED)的光提取效率。在此,蓝宝石衬底与GaN基LED之间的NP-AlN中间层在底部方向用作有效的光出射耦合层,并作为GaN LED生长的缓冲层。横截面透射电子显微镜(TEM)分析表明,堆垛层错和空洞的形成有助于减少位错。显微拉曼光谱还显示,在NP-AlN模板上生长的GaN基外延层比在平面蓝宝石衬底上生长的外延层具有更小的残余应力。器件顶部和底部的归一化电致发光(EL)光谱表明,由于NP-AlN的渐变折射率(GRIN)效应,具有NP-AlN中间层的LED底部发射的增强比平面蓝宝石衬底更显著。