Department of Occlusion, Fixed Prosthesis, and Dental Materials, Federal University of Uberlândia, School of Dentistry, Uberlândia, Brazil.
Int J Oral Maxillofac Implants. 2009 Sep-Oct;24(5):781-9.
To investigate the peri-implant stress fields generated from four different implant-abutment interfaces under axial loading applied at the center of the implant and several millimeters away from the implant center via photoelastic analysis.
Similar unthreaded and cylindric implants and abutments were fabricated and embedded in photoelastic resin with four different implant-abutment interfaces: external hex, internal hex, internal taper (11.5 degrees), and solid connection to the abutment (one piece). The samples were submitted to vertical compressive loads; one was applied at the implant center (1.5 kg; centered load), and the other was applied 6.5 mm away from the center, 4.4 mm from the outside of the outer aspect of the implant (0.75 kg; off-centered load). The maximum shear stresses were determined and observed at 46 points around the implants under the centered load and at 61 points under the off-center load in the photoelastic models. Graphics describing the maximum shear stress (y-axis) and the analyzed points (x-axis) were obtained, and areas under the curves were calculated.
The centered loading (all points) resulted in small differences. The lowest amounts of stress were observed for the internal-taper implants, and values were minimally greater (0.4% to 3.3%) for the other implants. No statistically significant differences were found between groups for the centered load in any area. Under an off-center load, the internal-hex implants presented the least stress (all points). For off-center loading, the internal-hexagon implants differed significantly from the external-hex and one-piece implants and displayed the lowest stress levels.
Under an off-center load, the internal-hex interfaces presented the lowest stress concentrations, internal-taper interfaces presented intermediate results, and one-piece and external-hex implants resulted in high stress levels. Centralized axial loads produced similar results.
通过光弹分析研究在种植体中心和种植体中心几毫米处施加轴向载荷时,四种不同种植体-基台界面产生的种植体周围的应力场。
制造并将类似的无螺纹圆柱形种植体和基台用四种不同的种植体-基台界面(外六方、内六方、内锥形(11.5 度)和与基台的整体连接(一件式))嵌入光弹树脂中。将样本置于垂直压缩载荷下;一个在种植体中心施加(1.5 公斤;中心载荷),另一个在中心 6.5 毫米处施加,在种植体外侧面外 4.4 毫米处施加(0.75 公斤;偏心载荷)。在中心载荷下,在种植体周围的 46 个点和偏心载荷下的 61 个点确定并观察最大剪应力。在光弹模型中,获得了描述最大剪应力(y 轴)和分析点(x 轴)的图形,并计算了曲线下的面积。
中心载荷(所有点)导致差异较小。内部锥形种植体的应力最小,其他种植体的应力值略高(0.4%至 3.3%)。在任何区域,中心载荷下各组之间均无统计学差异。在偏心载荷下,内六角种植体的应力最小(所有点)。对于偏心加载,内六方种植体与外六方和一件式种植体明显不同,显示出最低的应力水平。
在偏心载荷下,内六方界面呈现出最低的应力集中,内锥形界面呈现出中等的结果,一件式和外六方种植体产生高的应力水平。集中轴向载荷产生相似的结果。