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通过空间分辨 NEXAFS 对 TiO2 忆阻器件的结构和化学特性进行表征。

Structural and chemical characterization of TiO2 memristive devices by spatially-resolved NEXAFS.

机构信息

Hewlett-Packard Labs, 1501 Page Mill Road, Palo Alto, CA 94304, USA.

出版信息

Nanotechnology. 2009 Dec 2;20(48):485701. doi: 10.1088/0957-4484/20/48/485701. Epub 2009 Oct 30.

DOI:10.1088/0957-4484/20/48/485701
PMID:19880979
Abstract

We used spatially-resolved NEXAFS (near-edge x-ray absorption fine structure) spectroscopy coupled with microscopy to characterize the electronic, structural and chemical properties of bipolar resistive switching devices. Metal/TiO2/metal devices were electroformed with both bias polarities and then physically opened to study the resulting material changes within the device. Soft x-ray absorption techniques allowed isolated study of the different materials present in the device with 100 nm spatial resolution. The resulting morphology and structural changes reveal a picture of localized polarity-independent heating occurring within these devices initiated by and subsequently accelerating polarity-dependent electrochemical reduction/oxidation processes.

摘要

我们使用空间分辨近边 X 射线吸收精细结构(NEXAFS)光谱学结合显微镜来表征双极性电阻开关器件的电子、结构和化学性质。金属/TiO2/金属器件在两种偏压下进行电成形,然后进行物理打开以研究器件内的材料变化。软 X 射线吸收技术允许对器件中不同材料进行 100nm 空间分辨率的孤立研究。所得形貌和结构变化揭示了这样一个画面:在这些器件中,局部的、与极性无关的加热是由随后加速的、与极性相关的电化学还原/氧化过程引发的。

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