School of Chemical and Biomedical Engineering, Nanyang Technological University, 70 Nanyang Drive, Singapore 637457, Singapore.
Small. 2010 May 21;6(10):1077-81. doi: 10.1002/smll.200901198.
The controlled patterning of nanomaterials presents a major challenge to the field of nanolithography because of differences in size, shape and solubility of these materials. Matrix-assisted dip-pen nanolithography and polymer pen lithography provide a solution to this problem by utilizing a polymeric matrix that encapsulates the nanomaterials and delivers them to surfaces with precise control of feature size.
由于这些材料在尺寸、形状和溶解度方面存在差异,因此对纳米光刻领域来说,对纳米材料进行可控图案化是一项重大挑战。基质辅助的浸笔纳米光刻和聚合物笔光刻通过利用封装纳米材料并将其递送到表面的聚合物基质来解决这个问题,并且可以精确控制特征尺寸。