International Institute for Nanotechnology, Evanston, Illinois 60208, USA.
Nano Lett. 2010 Apr 14;10(4):1335-40. doi: 10.1021/nl904200t.
Polymer pen lithography is a recently developed molecular printing technique which can produce features with diameters ranging from 80 nm to >10 microm in a single writing step using massively parallel (>10(7) pens) arrays of pyramidal, elastomeric pens. Leveling these pen arrays with respect to the surface to produce uniform features over large areas remains a considerable challenge. Here, we describe a new method for leveling the pen arrays that utilizes the force between the pen arrays and the surface to achieve leveling with a tilt of less than 0.004 degrees, thereby producing features that vary by only 50 nm over 1 cm.
高分子笔式光刻是一种最近发展起来的分子打印技术,它可以在单个书写步骤中使用大量并行(>10^7 个)的金字塔形弹性笔,制作出直径从 80nm 到>10μm 的特征。将这些笔阵列与表面对准,以在大面积上产生均匀的特征仍然是一个相当大的挑战。在这里,我们描述了一种新的方法来对笔阵列进行水平调整,该方法利用笔阵列和表面之间的力来实现小于 0.004 度的倾斜,从而产生在 1cm 范围内仅变化 50nm 的特征。