Baig M N, Ahmed W, Khalid F A, Said R M, McLaughlin J
Faculty of Materials Science and Engineering, Ghulam Ishaq Khan Institute of Engineering Sciences and Technology, Topi, District Swabi, NWFP 23640, Pakistan.
J Nanosci Nanotechnol. 2009 Jul;9(7):4034-9. doi: 10.1166/jnn.2009.m07.
Approximately 1 microm thick NiAl and Ni-Al-N thin films have been deposited from individual elemental Ni (99.5% pure) and Al (99.5% pure) targets onto glass and stainless steel 316 substrates using closed field unbalanced magnetron sputter ion platting (CFUBMSIP) process. The films have been characterized using stylus profilometry, energy dispersive spectroscopy (EDAX), X-ray diffractometry (XRD) and atomic force microscopy (AFM). The X-ray diffraction patterns of both types of thin films produced confirmed the formation of beta-NiAl phase. The EDAX results revealed that all of the NiAl thin films produced exhibited the near equiatomic NiAl phase with the best results given by the one deposited using 300 Watts DC power for Ni and 400 Watts DC power for Al targets respectively. However, the Ni-Al-N thin films showed a Ni-rich NiAl phase. AFM results of both types of films produced carried out on glass samples exhibited that the coatings have quite a smooth surface with surface roughness in nanometres range.
使用封闭场非平衡磁控溅射离子镀（CFUBMSIP）工艺，已将约1微米厚的NiAl和Ni-Al-N薄膜从单独的元素镍（纯度99.5%）和铝（纯度99.5%）靶材沉积到玻璃和316不锈钢基板上。已使用触针式轮廓仪、能量色散光谱（EDAX）、X射线衍射仪（XRD）和原子力显微镜（AFM）对这些薄膜进行了表征。所制备的两种类型薄膜的X射线衍射图谱证实了β-NiAl相的形成。EDAX结果表明，所制备的所有NiAl薄膜均呈现近等原子比的NiAl相，分别使用300瓦直流功率的镍靶和400瓦直流功率的铝靶沉积的薄膜效果最佳。然而，Ni-Al-N薄膜显示出富镍的NiAl相。在玻璃样品上对所制备的两种类型薄膜进行的AFM结果表明，涂层表面相当光滑，表面粗糙度在纳米范围内。
