Philips Research Laboratories, High Tech Campus 4, 5656 AE Eindhoven, The Netherlands.
Opt Lett. 2009 Dec 1;34(23):3680-2. doi: 10.1364/OL.34.003680.
We have developed a multilayer mirror for extreme ultraviolet (EUV) radiation that has low reflectance for IR radiation at 10.6 mum wavelength. The mirror is based on a multilayer coating comprising alternating layers of diamondlike carbon and silicon, for which we demonstrate an EUV reflectance of up to 49.7%. We have made a functional prototype in which the multilayer coating is included as part of an antireflection coating for IR radiation, resulting in reflectance values of 42.5% and 4.4% for EUV and IR, respectively. The mirror can replace a standard Mo/Si mirror in an EUV lithography tool to form an efficient solution for the suppression of unwanted CO(2) laser radiation.
我们研发出一种用于极紫外（EUV）辐射的多层反射镜，它对 10.6 微米波长的红外辐射的反射率很低。该反射镜基于包含交替的类金刚石碳和硅层的多层涂层，我们证明其 EUV 反射率高达 49.7%。我们已经制作出一个功能原型，其中多层涂层作为红外辐射的抗反射涂层的一部分，EUV 和 IR 的反射率分别为 42.5%和 4.4%。该反射镜可以替代 EUV 光刻工具中的标准 Mo/Si 反射镜，为抑制不必要的 CO(2)激光辐射提供有效的解决方案。
