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采用脉冲激光熔融技术在金属中进行超快直接压印纳米结构。

Ultrafast direct imprinting of nanostructures in metals by pulsed laser melting.

机构信息

Department of Electrical Engineering, Princeton University, Princeton, NJ 08544, USA.

出版信息

Nanotechnology. 2010 Jan 29;21(4):045303. doi: 10.1088/0957-4484/21/4/045303. Epub 2009 Dec 16.

DOI:10.1088/0957-4484/21/4/045303
PMID:20009206
Abstract

We report a method of one-step direct patterning of metallic nanostructures. In the method, termed laser assisted direct imprinting (LADI), the surface of a metal film on a substrate is melted by a single excimer laser pulse and subsequently imprinted within approximately 100 ns using a transparent quartz mold, while the substrate is kept at a low temperature and in a solid phase. Using LADI, we imprinted gratings with approximately 100 nm linewidth, 100 nm depth, and 200 nm pitch, as well as isolated mesas of approximately 20 microm size, in Al, Au, Cu and Ni thin films. We found that the quartz mold was able to imprint metals even at temperatures higher than its melting point. The technique could be extended to other metals regardless of their ductility and hardness, and would find applications in photonic and plasmonic device production.

摘要

我们报告了一种一步直接图案化金属纳米结构的方法。在该方法中,称为激光辅助直接压印(LADI),通过单个准分子激光脉冲将基底上的金属膜的表面熔化,然后在大约 100 ns 内使用透明石英模具进行压印,同时将基底保持在低温和固相。使用 LADI,我们在 Al、Au、Cu 和 Ni 薄膜中压印了具有约 100 nm 线宽、100 nm 深度和 200 nm 节距的光栅,以及大约 20 µm 尺寸的孤立台面。我们发现,即使在高于石英模具熔点的温度下,石英模具也能够压印金属。该技术可以扩展到其他金属,而不考虑它们的延展性和硬度,并将在光子和等离子体器件生产中得到应用。

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