Bradford A P, Hass G, Osantowski J F, Toft A R
Appl Opt. 1969 Jun 1;8(6):1183-9. doi: 10.1364/AO.8.001183.
The design and features of a 2-m evaporator suitable for coating large mirrors uniformly with Al + MgF(2) and Al + LiF films of high reflectance in the vacuum uv are described. The techniques used for monitoring film thicknesses during the film deposition and for producing films of uniform thicknesses over large areas are discussed. It is shown that the Al films for MgF(2)_ and LiF-protected mirrors of highest reflectance in the vacuum uv down to 1000 A should be 700-800 A thick. Data on the vacuum uv reflectance of Al coated with MgF(2) films of various thicknesses are presented. It was found that mirror coatings prepared in a large evaporator have a higher reflectance in the vacuum uv than those deposited under the same vacuum and deposition conditions in a small vacuum unit. At lambda = 1216 A, the reflectance of Al overcoated with 250 A of MgF(2) was measured to be about 85%.
本文描述了一种2米长的蒸发器的设计与特性,该蒸发器适用于在真空紫外光波段为大型镜子均匀涂覆高反射率的Al + MgF₂和Al + LiF薄膜。讨论了在薄膜沉积过程中用于监测膜厚以及在大面积上制备均匀厚度薄膜的技术。结果表明,对于在真空紫外光波段直至1000埃具有最高反射率的MgF₂和LiF保护镜,Al膜的厚度应为700 - 800埃。给出了涂覆不同厚度MgF₂膜的Al在真空紫外光波段的反射率数据。研究发现,在大型蒸发器中制备的镜面涂层在真空紫外光波段的反射率高于在相同真空和沉积条件下在小型真空装置中沉积的涂层。在波长λ = 1216埃时,测量得到涂覆250埃MgF₂的Al的反射率约为85%。