Bradford A P, Hass G, McFarland M
Appl Opt. 1972 Oct 1;11(10):2242-4. doi: 10.1364/AO.11.002242.
This paper presents data on the optical properties of evaporated MgO films in the wavelength region from 0.22 micro to 8 micro. The films were deposited in high vacuum with an electron gun at a rate of about 20 A/sec, and their refractive indices were determined using three different techniques. The absorptance of the films was found to be negligible over the wavelength region measured. Films deposited on substrates of 50 degrees C had refractive indices of 1.70 at lambda = 0.55 micro and 1.62 at lambda = 4 micro, while those condensed at 300 degrees C showed at the same wavelengths n-values of 1.74 and 1.66, respectively. All MgO films were found to be crystalline showing the cubic structure and lattice constant of the bulk material. Their crystal size increased with increasing substrate temperature. MgO proved to be a suitable film compound for producing three-layer antireflection coatings on glass. It can also be used in combination with SiO(2) or MgF(2) for preparing protected Al front surface mirrors with 95% reflectance at lambda = 0.25 micro. During extended exposure to normal air a hazy, bluish scattering coating forms on the surface of MgO films that limits their usefulness as an optical coating material.
本文给出了蒸发氧化镁薄膜在0.22微米至8微米波长范围内的光学性质数据。这些薄膜是在高真空中用电子枪以约20埃/秒的速率沉积的,其折射率用三种不同技术测定。在所测量的波长范围内,发现薄膜的吸收率可忽略不计。沉积在50摄氏度基板上的薄膜在波长λ = 0.55微米时折射率为1.70,在λ = 4微米时为1.62,而在300摄氏度冷凝的薄膜在相同波长下的n值分别为1.74和1.66。所有氧化镁薄膜均为晶体,呈现出块状材料的立方结构和晶格常数。其晶体尺寸随基板温度升高而增大。氧化镁被证明是一种适用于在玻璃上制备三层抗反射涂层的薄膜化合物。它还可与二氧化硅或氟化镁结合使用,以制备在λ = 0.25微米时反射率为95%的受保护铝前表面镜。在长时间暴露于正常空气中时,氧化镁薄膜表面会形成一层模糊的蓝色散射涂层,这限制了它们作为光学涂层材料的用途。